Information card for entry 2206923
| Chemical name |
3,6-Bis(p-chlorophenyl)-1,4-bis(p-tolylsulfonyl)-1,4-dihydro-1,2,4,5-tetrazine |
| Formula |
C28 H22 Cl2 N4 O4 S2 |
| Calculated formula |
C28 H22 Cl2 N4 O4 S2 |
| SMILES |
Clc1ccc(cc1)c1nn(c(nn1S(=O)(=O)c1ccc(cc1)C)c1ccc(cc1)Cl)S(=O)(=O)c1ccc(cc1)C |
| Title of publication |
3,6-Bis(<i>p</i>-chlorophenyl)-1,4-bis(<i>p</i>-tolylsulfonyl)-1,4-dihydro-1,2,4,5-tetrazine |
| Authors of publication |
Wei-Xiao Hu; Lu-Ping Lv; Feng Xu; Hai-Bo Shi |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2005 |
| Journal volume |
61 |
| Journal issue |
10 |
| Pages of publication |
o3152 - o3153 |
| a |
19.313 ± 0.008 Å |
| b |
7.007 ± 0.004 Å |
| c |
20.998 ± 0.004 Å |
| α |
90 ± 0.03° |
| β |
107.5 ± 0.02° |
| γ |
90 ± 0.05° |
| Cell volume |
2710 ± 2 Å3 |
| Cell temperature |
292 ± 2 K |
| Ambient diffraction temperature |
292 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
15 |
| Hermann-Mauguin space group symbol |
C 1 2/c 1 |
| Hall space group symbol |
-C 2yc |
| Residual factor for all reflections |
0.0577 |
| Residual factor for significantly intense reflections |
0.036 |
| Weighted residual factors for significantly intense reflections |
0.0938 |
| Weighted residual factors for all reflections included in the refinement |
0.105 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.061 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2206923.html