Information card for entry 2207052
| Chemical name |
3,5,3',5'-Tetramethyl-N,N'-bis(salicylidene)biphenyl-4,4'-diamine |
| Formula |
C30 H28 N2 O2 |
| Calculated formula |
C30 H28 N2 O2 |
| SMILES |
c1(ccccc1/C=N/c1c(cc(cc1C)c1cc(c(c(c1)C)/N=C/c1ccccc1O)C)C)O |
| Title of publication |
3,5,3',5'-Tetramethyl-<i>N</i>,<i>N</i>'-bis(salicylidene)biphenyl-4,4'-diamine |
| Authors of publication |
Xu, Li; Kim, Youngmee; Kim, Sung-Jin |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2005 |
| Journal volume |
61 |
| Journal issue |
10 |
| Pages of publication |
o3344 - o3345 |
| a |
10.693 ± 0.005 Å |
| b |
12.896 ± 0.006 Å |
| c |
17.673 ± 0.008 Å |
| α |
90° |
| β |
90.871 ± 0.009° |
| γ |
90° |
| Cell volume |
2436.8 ± 1.9 Å3 |
| Cell temperature |
273 ± 2 K |
| Ambient diffraction temperature |
273 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.1702 |
| Residual factor for significantly intense reflections |
0.0643 |
| Weighted residual factors for significantly intense reflections |
0.1323 |
| Weighted residual factors for all reflections included in the refinement |
0.1734 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.928 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2207052.html