Information card for entry 2207052
Chemical name |
3,5,3',5'-Tetramethyl-N,N'-bis(salicylidene)biphenyl-4,4'-diamine |
Formula |
C30 H28 N2 O2 |
Calculated formula |
C30 H28 N2 O2 |
SMILES |
c1(ccccc1/C=N/c1c(cc(cc1C)c1cc(c(c(c1)C)/N=C/c1ccccc1O)C)C)O |
Title of publication |
3,5,3',5'-Tetramethyl-<i>N</i>,<i>N</i>'-bis(salicylidene)biphenyl-4,4'-diamine |
Authors of publication |
Xu, Li; Kim, Youngmee; Kim, Sung-Jin |
Journal of publication |
Acta Crystallographica Section E |
Year of publication |
2005 |
Journal volume |
61 |
Journal issue |
10 |
Pages of publication |
o3344 - o3345 |
a |
10.693 ± 0.005 Å |
b |
12.896 ± 0.006 Å |
c |
17.673 ± 0.008 Å |
α |
90° |
β |
90.871 ± 0.009° |
γ |
90° |
Cell volume |
2436.8 ± 1.9 Å3 |
Cell temperature |
273 ± 2 K |
Ambient diffraction temperature |
273 ± 2 K |
Number of distinct elements |
4 |
Space group number |
14 |
Hermann-Mauguin space group symbol |
P 1 21/c 1 |
Hall space group symbol |
-P 2ybc |
Residual factor for all reflections |
0.1702 |
Residual factor for significantly intense reflections |
0.0643 |
Weighted residual factors for significantly intense reflections |
0.1323 |
Weighted residual factors for all reflections included in the refinement |
0.1734 |
Goodness-of-fit parameter for all reflections included in the refinement |
0.928 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
Yes |
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The link is:
https://www.crystallography.net/2207052.html