Information card for entry 2225254
Chemical name |
<i>N</i>-(4-Chlorophenyl)-1,1,1-trifluoro-<i>N</i>- (trifluoromethylsulfonyl)methanesulfonamide |
Formula |
C8 H4 Cl F6 N O4 S2 |
Calculated formula |
C8 H4 Cl F6 N O4 S2 |
SMILES |
Clc1ccc(N(S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F)cc1 |
Title of publication |
<i>N</i>-(4-Chlorophenyl)-1,1,1-trifluoro-<i>N</i>-(trifluoromethylsulfonyl)methanesulfonamide |
Authors of publication |
Boechat, Núbia; dos Santos Lages, Adriana; Kover, Warner B.; Tiekink, Edward R. T.; Wardell, James L.; Wardell, Solange M. S. V. |
Journal of publication |
Acta Crystallographica Section E |
Year of publication |
2010 |
Journal volume |
66 |
Journal issue |
3 |
Pages of publication |
o506 - o507 |
a |
11.5998 ± 0.0003 Å |
b |
13.4423 ± 0.0004 Å |
c |
9.0548 ± 0.0002 Å |
α |
90° |
β |
108.014 ± 0.002° |
γ |
90° |
Cell volume |
1342.69 ± 0.06 Å3 |
Cell temperature |
120 ± 2 K |
Ambient diffraction temperature |
120 ± 2 K |
Number of distinct elements |
7 |
Space group number |
14 |
Hermann-Mauguin space group symbol |
P 1 21/c 1 |
Hall space group symbol |
-P 2ybc |
Residual factor for all reflections |
0.034 |
Residual factor for significantly intense reflections |
0.031 |
Weighted residual factors for significantly intense reflections |
0.08 |
Weighted residual factors for all reflections included in the refinement |
0.082 |
Goodness-of-fit parameter for all reflections included in the refinement |
1.04 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
Yes |
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https://www.crystallography.net/2225254.html