Information card for entry 2225254
| Chemical name |
<i>N</i>-(4-Chlorophenyl)-1,1,1-trifluoro-<i>N</i>- (trifluoromethylsulfonyl)methanesulfonamide |
| Formula |
C8 H4 Cl F6 N O4 S2 |
| Calculated formula |
C8 H4 Cl F6 N O4 S2 |
| SMILES |
Clc1ccc(N(S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F)cc1 |
| Title of publication |
<i>N</i>-(4-Chlorophenyl)-1,1,1-trifluoro-<i>N</i>-(trifluoromethylsulfonyl)methanesulfonamide |
| Authors of publication |
Boechat, Núbia; dos Santos Lages, Adriana; Kover, Warner B.; Tiekink, Edward R. T.; Wardell, James L.; Wardell, Solange M. S. V. |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2010 |
| Journal volume |
66 |
| Journal issue |
3 |
| Pages of publication |
o506 - o507 |
| a |
11.5998 ± 0.0003 Å |
| b |
13.4423 ± 0.0004 Å |
| c |
9.0548 ± 0.0002 Å |
| α |
90° |
| β |
108.014 ± 0.002° |
| γ |
90° |
| Cell volume |
1342.69 ± 0.06 Å3 |
| Cell temperature |
120 ± 2 K |
| Ambient diffraction temperature |
120 ± 2 K |
| Number of distinct elements |
7 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.034 |
| Residual factor for significantly intense reflections |
0.031 |
| Weighted residual factors for significantly intense reflections |
0.08 |
| Weighted residual factors for all reflections included in the refinement |
0.082 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.04 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2225254.html