Information card for entry 2226164
| Chemical name |
2,4,6,8-Tetrakis(4-ethylphenyl)-3,7-diazabicyclo[3.3.1]nonan-9-one |
| Formula |
C39 H44 N2 O |
| Calculated formula |
C39 H44 N2 O |
| SMILES |
O=C1C2[C@@H](N[C@@H](C1[C@H](N[C@H]2c1ccc(cc1)CC)c1ccc(cc1)CC)c1ccc(cc1)CC)c1ccc(cc1)CC |
| Title of publication |
2,4,6,8-Tetrakis(4-ethylphenyl)-3,7-diazabicyclo[3.3.1]nonan-9-one |
| Authors of publication |
Rajesh, K.; Vijayakumar, V.; Safwan, A. P.; Tan, Kong Wai; Tiekink, Edward R. T. |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2010 |
| Journal volume |
66 |
| Journal issue |
6 |
| Pages of publication |
o1316 |
| a |
13.381 ± 0.002 Å |
| b |
11.8217 ± 0.0017 Å |
| c |
19.989 ± 0.003 Å |
| α |
90° |
| β |
99.675 ± 0.004° |
| γ |
90° |
| Cell volume |
3117 ± 0.8 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.055 |
| Residual factor for significantly intense reflections |
0.042 |
| Weighted residual factors for significantly intense reflections |
0.108 |
| Weighted residual factors for all reflections included in the refinement |
0.117 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.03 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/2226164.html