Information card for entry 2226972
| Chemical name |
3,3,6,6-Tetramethyl-9-(2-nitrophenyl)-3,4,6,7-tetrahydro-2<i>H</i>-xanthene-1, 8(5<i>H</i>,9<i>H</i>)-dione |
| Formula |
C23 H25 N O5 |
| Calculated formula |
C23 H25 N O5 |
| SMILES |
O1C2=C(C(=O)CC(C2)(C)C)C(C2=C1CC(CC2=O)(C)C)c1cccc(N(=O)=O)c1 |
| Title of publication |
3,3,6,6-Tetramethyl-9-(2-nitrophenyl)-3,4,6,7-tetrahydro-2<i>H</i>-xanthene-1,8(5<i>H</i>,9<i>H</i>)-dione |
| Authors of publication |
Mo, Yingming; Zang, Hong-Jun; Cheng, Bo-Wen |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2010 |
| Journal volume |
66 |
| Journal issue |
8 |
| Pages of publication |
o2129 |
| a |
12.199 ± 0.002 Å |
| b |
10.51 ± 0.002 Å |
| c |
32.484 ± 0.007 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
4164.8 ± 1.4 Å3 |
| Cell temperature |
113 ± 2 K |
| Ambient diffraction temperature |
113 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
61 |
| Hermann-Mauguin space group symbol |
P b c a |
| Hall space group symbol |
-P 2ac 2ab |
| Residual factor for all reflections |
0.0737 |
| Residual factor for significantly intense reflections |
0.0632 |
| Weighted residual factors for significantly intense reflections |
0.1385 |
| Weighted residual factors for all reflections included in the refinement |
0.1444 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.158 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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The link is:
https://www.crystallography.net/2226972.html