Information card for entry 2227362
Common name |
1,3,5-Tris(5-phenyl-1,3,4-oxadiazol-2-ylsulfanylmethyl)-2,4,6-trimethylbenzene |
Chemical name |
5,5',5''-Triphenyl-2,2',2''-[2,4,6-trimethylbenzene-1,3,5- triyltris(methylidenesulfanediyl)]tris(1,3,4-oxadiazole) |
Formula |
C36 H30 N6 O3 S3 |
Calculated formula |
C36 H30 N6 O3 S3 |
SMILES |
S(Cc1c(c(c(c(c1C)CSc1oc(nn1)c1ccccc1)C)CSc1oc(nn1)c1ccccc1)C)c1oc(nn1)c1ccccc1 |
Title of publication |
5,5',5''-Triphenyl-2,2',2''-[2,4,6-trimethylbenzene-1,3,5-triyltris(methylidenesulfanediyl)]tris(1,3,4-oxadiazole) |
Authors of publication |
Wang, Wei; Gao, Yan; Ji, Ming; Yao, Hong-guo; Qiu, Hong |
Journal of publication |
Acta Crystallographica Section E |
Year of publication |
2010 |
Journal volume |
66 |
Journal issue |
11 |
Pages of publication |
o2835 |
a |
19.87 ± 0.004 Å |
b |
9.1305 ± 0.0018 Å |
c |
18.557 ± 0.004 Å |
α |
90° |
β |
107 ± 0.03° |
γ |
90° |
Cell volume |
3219.6 ± 1.3 Å3 |
Cell temperature |
113 ± 2 K |
Ambient diffraction temperature |
113 ± 2 K |
Number of distinct elements |
5 |
Space group number |
14 |
Hermann-Mauguin space group symbol |
P 1 21/c 1 |
Hall space group symbol |
-P 2ybc |
Residual factor for all reflections |
0.0693 |
Residual factor for significantly intense reflections |
0.0491 |
Weighted residual factors for significantly intense reflections |
0.1203 |
Weighted residual factors for all reflections included in the refinement |
0.1486 |
Goodness-of-fit parameter for all reflections included in the refinement |
1.095 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
Yes |
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The link is:
https://www.crystallography.net/2227362.html