Information card for entry 2234789
| Chemical name |
<i>N</i>-(3,4-Difluorophenyl)-2,2-diphenylacetamide |
| Formula |
C20 H15 F2 N O |
| Calculated formula |
C20 H15 F2 N O |
| SMILES |
O=C(C(c1ccccc1)c1ccccc1)Nc1ccc(c(c1)F)F |
| Title of publication |
<i>N</i>-(3,4-Difluorophenyl)-2,2-diphenylacetamide |
| Authors of publication |
Fun, Hoong-Kun; Ooi, Chin Wei; Nayak, Prakash S.; Narayana, B.; Sarojini, B. K. |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2012 |
| Journal volume |
68 |
| Journal issue |
5 |
| Pages of publication |
o1349 - o1350 |
| a |
9.9756 ± 0.0002 Å |
| b |
18.0181 ± 0.0003 Å |
| c |
9.8107 ± 0.0002 Å |
| α |
90° |
| β |
117.064 ± 0.001° |
| γ |
90° |
| Cell volume |
1570.3 ± 0.05 Å3 |
| Cell temperature |
100 ± 1 K |
| Ambient diffraction temperature |
100 ± 1 K |
| Number of distinct elements |
5 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0697 |
| Residual factor for significantly intense reflections |
0.0518 |
| Weighted residual factors for significantly intense reflections |
0.1198 |
| Weighted residual factors for all reflections included in the refinement |
0.1303 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.026 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
Yes |
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https://www.crystallography.net/2234789.html