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Information card for entry 2242958
Preview
Coordinates | 2242958.cif |
---|---|
Structure factors | 2242958.hkl |
Original IUCr paper | HTML |
Chemical name | 4,4'-{[(1,4-Phenylenebis(methylene)]bis(oxy)}bis(3-methoxybenzaldehyde) |
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Formula | C24 H22 O6 |
Calculated formula | C24 H22 O6 |
SMILES | O(c1c(OCc2ccc(COc3ccc(C=O)cc3OC)cc2)ccc(C=O)c1)C |
Title of publication | Crystal structures and Hirshfeld surface analyses of 4,4'-{[1,3-phenylenebis(methylene)]bis(oxy)}bis(3-methoxybenzaldehyde) and 4,4'-{[(1,4-phenylenebis(methylene)]bis(oxy)}bis(3-methoxybenzaldehyde) |
Authors of publication | Iqbal, Saleem; Viswanathan, Vijayan; Velmurugan, Devadasan; Abiraman, Tamilselvan; Balasubramanian, Sengottuvelan; Gunasekaran, Krishnasamy |
Journal of publication | Acta Crystallographica Section E |
Year of publication | 2019 |
Journal volume | 75 |
Journal issue | 6 |
Pages of publication | 875 - 879 |
a | 12.6668 ± 0.0005 Å |
b | 7.747 ± 0.0003 Å |
c | 10.4244 ± 0.0004 Å |
α | 90° |
β | 102.126 ± 0.002° |
γ | 90° |
Cell volume | 1000.12 ± 0.07 Å3 |
Cell temperature | 296 ± 2 K |
Ambient diffraction temperature | 296 ± 2 K |
Number of distinct elements | 3 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0792 |
Residual factor for significantly intense reflections | 0.0567 |
Weighted residual factors for significantly intense reflections | 0.1778 |
Weighted residual factors for all reflections included in the refinement | 0.1896 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.14 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | Yes |
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