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Information card for entry 4000816
Preview
Coordinates | 4000816.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | ea007 |
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Chemical name | ea007 |
Formula | C74 H78 N2 O4 S8 |
Calculated formula | C74 H78 N2 O4 S8 |
SMILES | CCCC[C@H](CN1C(=O)c2cc(c3ccc(s3)c3ccc(s3)c3ccc(s3)c3ccc(s3)CCCCCC)c3c4c2c(C1=O)c(cc4C(=O)N(C3=O)C[C@H](CCCC)CC)c1ccc(s1)c1ccc(s1)c1ccc(s1)c1ccc(s1)CCCCCC)CC |
Title of publication | Design of New Electron Acceptor Materials for Organic Photovoltaics: Synthesis, Electron Transport, Photophysics, and Photovoltaic Properties of Oligothiophene-Functionalized Naphthalene Diimides |
Authors of publication | Ahmed, Eilaf; Ren, Guoqiang; Kim, Felix S.; Hollenbeck, Emily C.; Jenekhe, Samson A. |
Journal of publication | Chemistry of Materials |
Year of publication | 2011 |
Journal volume | 23 |
Journal issue | 20 |
Pages of publication | 4563 |
a | 20.041 ± 0.003 Å |
b | 16.808 ± 0.003 Å |
c | 9.9175 ± 0.0013 Å |
α | 90° |
β | 100.606 ± 0.005° |
γ | 90° |
Cell volume | 3283.6 ± 0.9 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.2102 |
Residual factor for significantly intense reflections | 0.0995 |
Weighted residual factors for significantly intense reflections | 0.2407 |
Weighted residual factors for all reflections included in the refinement | 0.3197 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.995 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4000816.html
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