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Information card for entry 4000916
Preview
Coordinates | 4000916.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C12 H24 N6 Ni O2 S2 |
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Calculated formula | C12 H24 N6 Ni O2 S2 |
SMILES | [Ni]12(OC(=NC(=[S]1)N(C)C)N(C)C)OC(=NC(=[S]2)N(C)C)N(C)C |
Title of publication | Nickel Sulfide Thin Films from Thio- and Dithiobiuret Precursors |
Authors of publication | Ramasamy, Karthik; Malik, Mohammad A.; O’Brien, Paul; Raftery, James; Helliwell, Madeleine |
Journal of publication | Chemistry of Materials |
Year of publication | 2010 |
Journal volume | 22 |
Journal issue | 23 |
Pages of publication | 6328 |
a | 13.888 ± 0.003 Å |
b | 6.9629 ± 0.0014 Å |
c | 18.451 ± 0.003 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 1784.2 ± 0.6 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 6 |
Space group number | 62 |
Hermann-Mauguin space group symbol | P n m a |
Hall space group symbol | -P 2ac 2n |
Residual factor for all reflections | 0.0904 |
Residual factor for significantly intense reflections | 0.0643 |
Weighted residual factors for significantly intense reflections | 0.1193 |
Weighted residual factors for all reflections included in the refinement | 0.1288 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.16 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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The link is: https://www.crystallography.net/4000916.html
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