Information card for entry 4001110
| Formula |
C22 H10 S4 |
| Calculated formula |
C22 H10 S4 |
| SMILES |
c1sc2c(c1)c1ccsc1c1c2cc2c(c1)c1sccc1c1c2scc1 |
| Title of publication |
Two-Dimensional Structural Motif in Thienoacene Semiconductors: Synthesis, Structure, and Properties of Tetrathienoanthracene Isomers |
| Authors of publication |
Brusso, Jaclyn L.; Hirst, Oliver D.; Dadvand, Afshin; Ganesan, Srinivasan; Cicoira, Fabio; Robertson, Craig M.; Oakley, Richard T.; Rosei, Federico; Perepichka, Dmitrii F. |
| Journal of publication |
Chemistry of Materials |
| Year of publication |
2008 |
| Journal volume |
20 |
| Journal issue |
7 |
| Pages of publication |
2484 |
| a |
11.278 ± 0.002 Å |
| b |
5.033 ± 0.0011 Å |
| c |
14.307 ± 0.003 Å |
| α |
90° |
| β |
92.006 ± 0.004° |
| γ |
90° |
| Cell volume |
811.6 ± 0.3 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
170 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.059 |
| Residual factor for significantly intense reflections |
0.0464 |
| Weighted residual factors for significantly intense reflections |
0.1103 |
| Weighted residual factors for all reflections included in the refinement |
0.1186 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.065 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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