Information card for entry 4001258

Structure parameters

• Formula: C21 H52 N2 O4 Pt Si
• Calculated formula: C21 H52 N2 O4 Pt Si
• SMILES: [Pt]1(O[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C)([N](C)(CC[N]1(C)C)C)(C)(C)C
• Title of publication: Site-Isolated Pt-SBA15 Materials from Tris(tert-butoxy)siloxy Complexes of Pt(II) and Pt(IV)
• Authors of publication: Ruddy, Daniel A.; Jarupatrakorn, Jonggol; Rioux, Robert M.; Miller, Jeffrey T.; McMurdo, Meredith J.; McBee, Jennifer L.; Tupper, Karl A.; Tilley, T. Don
• Journal of publication: Chemistry of Materials
• Year of publication: 2008
• Journal volume: 20
• Journal issue: 20
• Pages of publication: 6517
• a: 11.299 ± 0.003 Å
• b: 15.75 ± 0.004 Å
• c: 15.849 ± 0.004 Å
• α: 90°
• β: 95.882 ± 0.004°
• γ: 90°
• Cell volume: 2805.6 ± 1.3 ų
• Cell temperature: 150 ± 2 K
• Ambient diffraction temperature: 150 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.102
• Residual factor for significantly intense reflections: 0.0514
• Weighted residual factors for significantly intense reflections: 0.1047
• Weighted residual factors for all reflections included in the refinement: 0.1283
• Goodness-of-fit parameter for all reflections included in the refinement: 0.981
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No