Information card for entry 4003364
| Formula |
C30 H32 N2 O2 |
| Calculated formula |
C30 H32 N2 O2 |
| SMILES |
c12C(=O)c3c(c2cc2c(c1)c1c(C2=O)cc(cc1)N(C)CCCC)ccc(c3)N(C)CCCC |
| Title of publication |
Enhancing the Thermal Stability of Organic Field-Effect Transistors by Electrostatically Interlocked 2D Molecular Packing |
| Authors of publication |
Fan, Zhi-Ping; Li, Xiang-Yang; Purdum, Geoffrey E.; Hu, Chen-Xia; Fei, Xian; Shi, Zi-Fa; Sun, Chun-Lin; Shao, Xiangfeng; Loo, Yueh-Lin; Zhang, Hao-Li |
| Journal of publication |
Chemistry of Materials |
| Year of publication |
2018 |
| Journal volume |
30 |
| Journal issue |
11 |
| Pages of publication |
3638 |
| a |
7.5 ± 0.003 Å |
| b |
8.528 ± 0.004 Å |
| c |
10.009 ± 0.004 Å |
| α |
80.48 ± 0.04° |
| β |
73.28 ± 0.03° |
| γ |
83.45 ± 0.03° |
| Cell volume |
603.2 ± 0.5 Å3 |
| Cell temperature |
293.18 ± 0.1 K |
| Ambient diffraction temperature |
293.18 ± 0.1 K |
| Number of distinct elements |
4 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.2368 |
| Residual factor for significantly intense reflections |
0.0904 |
| Weighted residual factors for significantly intense reflections |
0.1812 |
| Weighted residual factors for all reflections included in the refinement |
0.278 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.961 |
| Diffraction radiation probe |
x-ray |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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