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Information card for entry 4003387
Preview
Coordinates | 4003387.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C50 H59 N4 O4 S6 |
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Calculated formula | C50 H59 N4 O4 S6 |
SMILES | s1c(c2sc(c3sc(c4sc(C5=N(=O)C(C([N]5=O)(C)C)(C)C)cc4)cc3)cc2CCCCCC)c(cc1c1sc(c2sc(C3=N(=O)C(C([N]3=O)(C)C)(C)C)cc2)cc1)CCCCCC |
Title of publication | Conjugated Oligomers with Stable Radical Substituents: Synthesis, Single Crystal Structures, Electronic Structure, and Excited State Dynamics |
Authors of publication | Huang, Yiming; Xu, Zihao; Jin, Shijian; Li, Chenyang; Warncke, Kurt; Evangelista, Francesco A.; Lian, Tianquan; Egap, Eilaf |
Journal of publication | Chemistry of Materials |
Year of publication | 2018 |
Journal volume | 30 |
Journal issue | 21 |
Pages of publication | 7840 |
a | 11.9625 ± 0.0002 Å |
b | 16.1003 ± 0.0003 Å |
c | 27.6827 ± 0.0005 Å |
α | 77.6816 ± 0.0015° |
β | 88.6733 ± 0.0015° |
γ | 84.4995 ± 0.0015° |
Cell volume | 5184.93 ± 0.16 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1455 |
Residual factor for significantly intense reflections | 0.107 |
Weighted residual factors for significantly intense reflections | 0.2814 |
Weighted residual factors for all reflections included in the refinement | 0.3105 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.03 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4003387.html
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