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Information card for entry 4028407
Preview
Coordinates | 4028407.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C26 H44 N4 O8 Si2 |
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Calculated formula | C26 H44 N4 O8 Si2 |
SMILES | [Si]1(O[Si](OC[C@@H]2[C@H](O[C@H](C2)C/C=N/Nc2c(N(=O)=O)cc(N(=O)=O)cc2)CO1)(C(C)C)C(C)C)(C(C)C)C(C)C.[Si]1(O[Si](OC[C@H]2[C@@H](O[C@@H](C2)C/C=N/Nc2c(N(=O)=O)cc(N(=O)=O)cc2)CO1)(C(C)C)C(C)C)(C(C)C)C(C)C |
Title of publication | Nucleophilic Addition to Silyl-Protected Five-Membered Ring Oxocarbenium Ions Governed by Stereoelectronic Effects |
Authors of publication | Vi Tuong Tran; K. A. Woerpel |
Journal of publication | Journal of Organic Chemistry |
Year of publication | 2013 |
Journal volume | 78 |
Pages of publication | 6609 - 6621 |
a | 22.418 ± 0.006 Å |
b | 7.659 ± 0.0019 Å |
c | 18.298 ± 0.005 Å |
α | 90° |
β | 100.87 ± 0.004° |
γ | 90° |
Cell volume | 3085.4 ± 1.4 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.1617 |
Residual factor for significantly intense reflections | 0.0933 |
Weighted residual factors for significantly intense reflections | 0.2181 |
Weighted residual factors for all reflections included in the refinement | 0.2357 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.033 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4028407.html
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Users of the data should acknowledge the original authors of the
structural data.