Information card for entry 4030837
| Formula |
C15 H23 N O5 S |
| Calculated formula |
C15 H23 N O5 S |
| SMILES |
N(C(=O)Oc1c(OC)cccc1[C@@H](S(=O)(=O)C)C)(CC)CC |
| Title of publication |
Highly Enantioselective (-)-Sparteine-Mediated Lateral Metalation-Functionalization of Remote Silyl Protected ortho-Ethyl N,N-Dialkyl Aryl O-Carbamates. |
| Authors of publication |
Fässler, Jürg; McCubbin, J. Adam; Roglans, Anna; Kimachi, Tetsutaro; Hollett, Joshua W.; Kunz, Roland W.; Tinkl, Michael; Zhang, Yousheng; Wang, Ruiyao; Campbell, Michael; Snieckus, Victor |
| Journal of publication |
The Journal of organic chemistry |
| Year of publication |
2015 |
| Journal volume |
80 |
| Journal issue |
7 |
| Pages of publication |
3368 |
| a |
20.529 ± 0.018 Å |
| b |
6.669 ± 0.006 Å |
| c |
12.889 ± 0.011 Å |
| α |
90° |
| β |
95.761 ± 0.013° |
| γ |
90° |
| Cell volume |
1756 ± 3 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
5 |
| Hermann-Mauguin space group symbol |
C 1 2 1 |
| Hall space group symbol |
C 2y |
| Residual factor for all reflections |
0.1072 |
| Residual factor for significantly intense reflections |
0.0407 |
| Weighted residual factors for significantly intense reflections |
0.0661 |
| Weighted residual factors for all reflections included in the refinement |
0.0744 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.778 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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