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Information card for entry 4030839
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Coordinates | 4030839.cif |
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Original paper (by DOI) | HTML |
Formula | C19 H33 N O2 S Si |
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Calculated formula | C19 H33 N O2 S Si |
SMILES | [Si](c1ccc([C@@H](SC)C)c(OC(=O)N(C(C)C)C(C)C)c1)(C)(C)C |
Title of publication | Highly Enantioselective (-)-Sparteine-Mediated Lateral Metalation-Functionalization of Remote Silyl Protected ortho-Ethyl N,N-Dialkyl Aryl O-Carbamates. |
Authors of publication | Fässler, Jürg; McCubbin, J. Adam; Roglans, Anna; Kimachi, Tetsutaro; Hollett, Joshua W.; Kunz, Roland W.; Tinkl, Michael; Zhang, Yousheng; Wang, Ruiyao; Campbell, Michael; Snieckus, Victor |
Journal of publication | The Journal of organic chemistry |
Year of publication | 2015 |
Journal volume | 80 |
Journal issue | 7 |
Pages of publication | 3368 |
a | 7.857 ± 0.0016 Å |
b | 11.876 ± 0.003 Å |
c | 13.396 ± 0.003 Å |
α | 70.095 ± 0.004° |
β | 77.111 ± 0.004° |
γ | 79.851 ± 0.004° |
Cell volume | 1138.8 ± 0.5 Å3 |
Cell temperature | 296 ± 2 K |
Ambient diffraction temperature | 296 ± 2 K |
Number of distinct elements | 6 |
Space group number | 1 |
Hermann-Mauguin space group symbol | P 1 |
Hall space group symbol | P 1 |
Residual factor for all reflections | 0.1223 |
Residual factor for significantly intense reflections | 0.0437 |
Weighted residual factors for significantly intense reflections | 0.0791 |
Weighted residual factors for all reflections included in the refinement | 0.092 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.744 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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