Information card for entry 4036991
| Formula |
C13 H10 F3 N O4 S3 |
| Calculated formula |
C13 H10 F3 N O4 S3 |
| SMILES |
S(=O)(=O)(N(S(=O)(=O)c1ccccc1)SC(F)(F)F)c1ccccc1 |
| Title of publication |
N-Trifluoromethylthio-dibenzenesulfonimide: A Shelf-Stable, Broadly Applicable Electrophilic Trifluoromethylthiolating Reagent. |
| Authors of publication |
Zhang, Panpan; Li, Man; Xue, Xiao-Song; Xu, Chunfa; Zhao, Qunchao; Liu, Yafei; Wang, Haoyang; Guo, Yinlong; Lu, Long; Shen, Qilong |
| Journal of publication |
The Journal of organic chemistry |
| Year of publication |
2016 |
| Journal volume |
81 |
| Journal issue |
17 |
| Pages of publication |
7486 - 7509 |
| a |
19.9936 ± 0.0016 Å |
| b |
7.5823 ± 0.0006 Å |
| c |
20.3944 ± 0.0018 Å |
| α |
90° |
| β |
91.36 ± 0.002° |
| γ |
90° |
| Cell volume |
3090.9 ± 0.4 Å3 |
| Cell temperature |
130 K |
| Ambient diffraction temperature |
130 K |
| Number of distinct elements |
6 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0892 |
| Residual factor for significantly intense reflections |
0.0469 |
| Weighted residual factors for significantly intense reflections |
0.0934 |
| Weighted residual factors for all reflections included in the refinement |
0.1092 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.012 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4036991.html