Information card for entry 4060221

Structure parameters

• Formula: C19 H44 B20 P2 Pt Si2
• Calculated formula: C20 H44 B20 P2 Pt Si2
• SMILES: C[P]1(C)[Pt]2([P]([C]3456[BH]789[BH]%10%113[BH]3%124[BH]4%135[C]569([BH]697[BH]78%10[BH]8%113[BH]3%124[BH]%1356[BH]9783)[Si]2(C)C)(C)C)[Si]([C]2345[BH]678[BH]9%10%11[BH]%12%13%14[BH]%152([C]148%11%13)[BH]12%14[BH]4%10%12[BH]879[BH]736[BH]5%151[BH]2487)(C)C.c1cc(C)ccc1C
• Title of publication: Synthesis, Structure, and DFT Calculation of (Phosphino-o-carboranyl)silyl Group 10 Metal Complexes: Formation of Stable trans-Bis(P,Si-chelate)metal Complexes
• Authors of publication: Young-Joo Lee; Jong-Dae Lee; Sung-Joon Kim; Samrok Keum; Jaejung Ko; Il-Hwan Suh; Minserk Cheong; Sang Ook Kang
• Journal of publication: Organometallics
• Year of publication: 2004
• Journal volume: 23
• Pages of publication: 203 - 214
• a: 8.6548 ± 0.0003 Å
• b: 11.0158 ± 0.0008 Å
• c: 11.0685 ± 0.0007 Å
• α: 104.516 ± 0.005°
• β: 106.106 ± 0.004°
• γ: 98.033 ± 0.004°
• Cell volume: 956.32 ± 0.1 ų
• Cell temperature: 293 ± 2 K
• Ambient diffraction temperature: 293 ± 2 K
• Number of distinct elements: 6
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0309
• Residual factor for significantly intense reflections: 0.0288
• Weighted residual factors for all reflections: 0.0732
• Weighted residual factors for significantly intense reflections: 0.0722
• Goodness-of-fit parameter for all reflections: 1.078
• Goodness-of-fit parameter for significantly intense reflections: 1.071
• Diffraction radiation wavelength: 0.7107 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No