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Information card for entry 4068160
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Jmol._Canvas2D (Jmol) "jmolApplet0"[x]
Coordinates | 4068160.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C26 H25 B F15 Si2 |
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Calculated formula | C26 H25 B F10 Si2 |
SMILES | [Si]([C@@H](c1c(F)c(F)c(F)c(F)c1F)B(c1c(F)c(F)c(F)c(F)c1F)[C@@H]([Si](C)(C)C)c1ccccc1)(C)(C)C.[Si]([C@H](c1c(F)c(F)c(F)c(F)c1F)B(c1c(F)c(F)c(F)c(F)c1F)[C@H]([Si](C)(C)C)c1ccccc1)(C)(C)C |
Title of publication | Insertion Reactions of Diazomethanes and Electrophilic Boranes |
Authors of publication | Neu, Rebecca C.; Stephan, Douglas W. |
Journal of publication | Organometallics |
Year of publication | 2012 |
Journal volume | 31 |
Journal issue | 1 |
Pages of publication | 46 |
a | 10.1221 ± 0.0007 Å |
b | 25.2357 ± 0.0016 Å |
c | 11.117 ± 0.0008 Å |
α | 90° |
β | 97.856 ± 0.003° |
γ | 90° |
Cell volume | 2813.1 ± 0.3 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.0553 |
Residual factor for significantly intense reflections | 0.0393 |
Weighted residual factors for significantly intense reflections | 0.1257 |
Weighted residual factors for all reflections included in the refinement | 0.1393 |
Goodness-of-fit parameter for all reflections included in the refinement | 1 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4068160.html
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Users of the data should acknowledge the original authors of the
structural data.