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Information card for entry 4068162
Preview
Coordinates | 4068162.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C26 H20 B F15 Si2 |
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Calculated formula | C26 H20 B F15 Si2 |
SMILES | [Si]([C@H](c1c(F)c(F)c(F)c(F)c1F)B([C@H]([Si](C)(C)C)c1c(F)c(F)c(F)c(F)c1F)c1c(F)c(F)c(F)c(F)c1F)(C)(C)C.[Si]([C@@H](c1c(F)c(F)c(F)c(F)c1F)B([C@@H]([Si](C)(C)C)c1c(F)c(F)c(F)c(F)c1F)c1c(F)c(F)c(F)c(F)c1F)(C)(C)C |
Title of publication | Insertion Reactions of Diazomethanes and Electrophilic Boranes |
Authors of publication | Neu, Rebecca C.; Stephan, Douglas W. |
Journal of publication | Organometallics |
Year of publication | 2012 |
Journal volume | 31 |
Journal issue | 1 |
Pages of publication | 46 |
a | 9.7676 ± 0.0015 Å |
b | 15.44 ± 0.002 Å |
c | 19.306 ± 0.003 Å |
α | 90° |
β | 98.467 ± 0.006° |
γ | 90° |
Cell volume | 2879.8 ± 0.7 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0808 |
Residual factor for significantly intense reflections | 0.042 |
Weighted residual factors for significantly intense reflections | 0.0814 |
Weighted residual factors for all reflections included in the refinement | 0.0934 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.01 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4068162.html
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Users of the data should acknowledge the original authors of the
structural data.