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Information card for entry 4068864
Preview
Coordinates | 4068864.cif |
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Original paper (by DOI) | HTML |
Formula | C20 H52 Mn2 O2 Si4 |
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Calculated formula | C20 H52 Mn2 O2 Si4 |
Title of publication | Bis[(trimethylsilyl)methyl]manganese: Structural Variations of Its Solvent-Free and TMEDA-, Pyridine-, and Dioxane-Complexed Forms |
Authors of publication | Alberola, Antonio; Blair, Victoria L.; Carrella, Luca M.; Clegg, William; Kennedy, Alan R.; Klett, Jan; Mulvey, Robert E.; Newton, Sean; Rentschler, Eva; Russo, Luca |
Journal of publication | Organometallics |
Year of publication | 2009 |
Journal volume | 28 |
Journal issue | 7 |
Pages of publication | 2112 |
a | 8.2431 ± 0.001 Å |
b | 10.6831 ± 0.0018 Å |
c | 20.141 ± 0.003 Å |
α | 82.895 ± 0.016° |
β | 88.064 ± 0.015° |
γ | 67.505 ± 0.012° |
Cell volume | 1625.9 ± 0.4 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.059 |
Residual factor for significantly intense reflections | 0.0327 |
Weighted residual factors for significantly intense reflections | 0.0616 |
Weighted residual factors for all reflections included in the refinement | 0.0695 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.029 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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