Information card for entry 4069518

Structure parameters

• Formula: C74 H62 Cl10 O14 Sb4 Si4
• Calculated formula: C74 H60 Cl10 O14 Sb4 Si4
• SMILES: c1(ccc(cc1)Cl)[Sb]1234[O]5[Sb]67([O]1[Sb]18(c9ccc(cc9)Cl)([O]6[Sb]5([O]41)(O[Si](c1ccccc1)(O8)c1ccccc1)(O[Si](O7)(c1ccccc1)c1ccccc1)c1ccc(cc1)Cl)O[Si](O3)(c1ccccc1)c1ccccc1)(O[Si](c1ccccc1)(O2)c1ccccc1)c1ccc(cc1)Cl.O.C(Cl)(Cl)Cl.O.C(Cl)(Cl)Cl
• Title of publication: Organoantimony(V) Oxido Cubane Cluster [(p-X-C6H4Sb)4(O)4(Ph2SiO2)4] (X = Cl, Br) Stabilized by Diphenyldisiloxides
• Authors of publication: Prabhu, M. Santhana Raj; Jami, Ananda Kumar; Baskar, Viswanathan
• Journal of publication: Organometallics
• Year of publication: 2009
• Journal volume: 28
• Journal issue: 13
• Pages of publication: 3953
• a: 24.828 ± 0.013 Å
• b: 15.261 ± 0.008 Å
• c: 24.943 ± 0.013 Å
• α: 90°
• β: 111.925 ± 0.007°
• γ: 90°
• Cell volume: 8767 ± 8 ų
• Cell temperature: 298 ± 2 K
• Ambient diffraction temperature: 298 ± 2 K
• Number of distinct elements: 6
• Space group number: 15
• Hermann-Mauguin space group symbol: C 1 2/c 1
• Hall space group symbol: -C 2yc
• Residual factor for all reflections: 0.0581
• Residual factor for significantly intense reflections: 0.0497
• Weighted residual factors for significantly intense reflections: 0.1572
• Weighted residual factors for all reflections included in the refinement: 0.1691
• Goodness-of-fit parameter for all reflections included in the refinement: 1.062
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No