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Information card for entry 4069995
Preview
Coordinates | 4069995.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C89 H73 N O2 Si2 Ti |
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Calculated formula | C89 H73 N O2 Si2 Ti |
SMILES | [Ti]12([n]3c(c4c(O1)c(cc1ccccc41)[Si](c1ccccc1)(c1ccccc1)c1ccccc1)cccc3c1c(O2)c(cc2ccccc12)[Si](c1ccccc1)(c1ccccc1)c1ccccc1)(Cc1ccccc1)Cc1ccccc1.Cc1ccccc1.Cc1ccccc1 |
Title of publication | Group 4 Post-metallocene Complexes Incorporating Tridentate Silyl-Substituted Bis(naphthoxy)pyridine and Bis(naphthoxy)thiophene Ligands: Probing Systems for “Oscillating” Olefin Polymerization Catalysis |
Authors of publication | Kirillov, Evgueni; Roisnel, Thierry; Razavi, Abbas; Carpentier, Jean-François |
Journal of publication | Organometallics |
Year of publication | 2009 |
Journal volume | 28 |
Journal issue | 17 |
Pages of publication | 5036 |
a | 14.4456 ± 0.0009 Å |
b | 27.1008 ± 0.0014 Å |
c | 18.8544 ± 0.0011 Å |
α | 90° |
β | 107.695 ± 0.003° |
γ | 90° |
Cell volume | 7032 ± 0.7 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0828 |
Residual factor for significantly intense reflections | 0.05 |
Weighted residual factors for significantly intense reflections | 0.123 |
Weighted residual factors for all reflections included in the refinement | 0.1362 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.009 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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Users of the data should acknowledge the original authors of the
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