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Information card for entry 4071426
Preview
Coordinates | 4071426.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C76 H89 O24 P5 Sn4 |
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Calculated formula | C76 H82 O24 P5 Sn4 |
SMILES | [Sn]1234([O]5[Sn]6([O]1CC)(OP(=O)(Oc1c(cccc1C)C)O2)([O]=P1(Oc2c(cccc2C)C)O[Sn]5([O]=P(Oc2c(cccc2C)C)(O3)O)([O]=P(Oc2c(cccc2C)C)(O4)O[Sn]([OH]CC)(O1)(c1ccccc1)c1ccccc1)([O]=P(Oc2c(cccc2C)C)(O6)O)c1ccccc1)c1ccccc1)c1ccccc1.OCC |
Title of publication | Asymmetric Pentameric and Tetrameric Organooxotin Clusters: Insights into Their Formation through Partial Dearylation |
Authors of publication | Murugavel, Ramaswamy; Shanmugan, Swaminathan |
Journal of publication | Organometallics |
Year of publication | 2008 |
Journal volume | 27 |
Journal issue | 12 |
Pages of publication | 2784 |
a | 50.9261 ± 0.0017 Å |
b | 13.6704 ± 0.0017 Å |
c | 24.9438 ± 0.0009 Å |
α | 90° |
β | 91.687 ± 0.006° |
γ | 90° |
Cell volume | 17358 ± 2 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 5 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.1194 |
Residual factor for significantly intense reflections | 0.0683 |
Weighted residual factors for significantly intense reflections | 0.129 |
Weighted residual factors for all reflections included in the refinement | 0.1499 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.069 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4071426.html
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Users of the data should acknowledge the original authors of the
structural data.