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Information card for entry 4071610
Preview
Coordinates | 4071610.cif |
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Original paper (by DOI) | HTML |
Formula | C32 H51 Ge N2 P Si |
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Calculated formula | C32 H51 Ge N2 P Si |
SMILES | [Ge]1(P[Si](C)(C)C)[N](=C(C)C=C(N1c1c(cccc1C(C)C)C(C)C)C)c1c(cccc1C(C)C)C(C)C |
Title of publication | Facile Access to a Stable Divalent Germanium Compound with a Terminal PH2Group and Related PR2Derivatives |
Authors of publication | Yao, Shenglai; Brym, Markus; Merz, Klaus; Driess, Matthias |
Journal of publication | Organometallics |
Year of publication | 2008 |
Journal volume | 27 |
Journal issue | 14 |
Pages of publication | 3601 |
a | 8.9098 ± 0.0004 Å |
b | 19.6084 ± 0.0009 Å |
c | 19.6505 ± 0.001 Å |
α | 90° |
β | 90.364 ± 0.001° |
γ | 90° |
Cell volume | 3433 ± 0.3 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.073 |
Residual factor for significantly intense reflections | 0.0519 |
Weighted residual factors for significantly intense reflections | 0.1187 |
Weighted residual factors for all reflections included in the refinement | 0.1321 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.042 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4071610.html
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