Information card for entry 4071873
| Formula |
C30 H90 Si14 |
| Calculated formula |
C30 H90 Si14 |
| SMILES |
[Si]([Si]([Si]([Si]([Si]([Si]([Si]([Si]([Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C)(C)C)(C)C)(C)C)(C)C)(C)C)(C)C)([Si](C)(C)C)[Si](C)(C)C)(C)(C)C |
| Title of publication |
Structure, Conformation, and UV Absorption Behavior of Partially Trimethylsilylated Oligosilane Chains |
| Authors of publication |
Wallner, Andreas; Wagner, Harald; Baumgartner, Judith; Marschner, Christoph; Rohm, Henning W.; Köckerling, Martin; Krempner, Clemens |
| Journal of publication |
Organometallics |
| Year of publication |
2008 |
| Journal volume |
27 |
| Journal issue |
20 |
| Pages of publication |
5221 |
| a |
9.5206 ± 0.0019 Å |
| b |
14.645 ± 0.003 Å |
| c |
20.701 ± 0.004 Å |
| α |
81.88 ± 0.03° |
| β |
89.2 ± 0.03° |
| γ |
84.67 ± 0.03° |
| Cell volume |
2845 ± 1 Å3 |
| Cell temperature |
200 ± 2 K |
| Ambient diffraction temperature |
200 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.1328 |
| Residual factor for significantly intense reflections |
0.1076 |
| Weighted residual factors for significantly intense reflections |
0.2135 |
| Weighted residual factors for all reflections included in the refinement |
0.2255 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.237 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/4071873.html