Information card for entry 4074006
| Formula |
C22 H24 O3 Si |
| Calculated formula |
C22 H24 O3 Si |
| SMILES |
[Si](c1c(OC)cc(OC)cc1OC)(c1ccccc1)(c1ccccc1)C |
| Title of publication |
The 2,4,6-Trimethoxyphenyl Unit as a Unique Protecting Group for Silicon in Synthesis and the Silylation Potential of (2,4,6-Trimethoxyphenyl)silanes |
| Authors of publication |
Popp, Friedrich; Nätscher, Jennifer B.; Daiss, Jürgen O.; Burschka, Christian; Tacke, Reinhold |
| Journal of publication |
Organometallics |
| Year of publication |
2007 |
| Journal volume |
26 |
| Journal issue |
24 |
| Pages of publication |
6014 |
| a |
14.9422 ± 0.0015 Å |
| b |
26.233 ± 0.0016 Å |
| c |
40.473 ± 0.003 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
15865 ± 2 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
70 |
| Hermann-Mauguin space group symbol |
F d d d :2 |
| Hall space group symbol |
-F 2uv 2vw |
| Residual factor for all reflections |
0.0464 |
| Residual factor for significantly intense reflections |
0.0375 |
| Weighted residual factors for significantly intense reflections |
0.1023 |
| Weighted residual factors for all reflections included in the refinement |
0.1074 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.031 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4074006.html
