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Information card for entry 4075032
Preview
Coordinates | 4075032.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C42 H48 N2 Ni P2 Si2 |
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Calculated formula | C42 H48 N2 Ni P2 Si2 |
SMILES | [Ni]1([P](c2ccccc2)(c2ccccc2)c2ccccc2)([N](=P(N1[Si](C)(C)C)(c1ccccc1)c1ccccc1)[Si](C)(C)C)c1ccccc1 |
Title of publication | Ethylene Polymerization Using Discrete Nickel(II) Iminophosphonamide Complexes |
Authors of publication | Stapleton, Russell L.; Chai, Jianfang; Taylor, Nicholas J.; Collins, Scott |
Journal of publication | Organometallics |
Year of publication | 2006 |
Journal volume | 25 |
Journal issue | 10 |
Pages of publication | 2514 |
a | 12.3383 ± 0.0008 Å |
b | 13.5161 ± 0.0009 Å |
c | 23.3083 ± 0.0015 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 3887 ± 0.4 Å3 |
Cell temperature | 150 ± 1 K |
Ambient diffraction temperature | 150 ± 1 K |
Number of distinct elements | 6 |
Space group number | 19 |
Hermann-Mauguin space group symbol | P 21 21 21 |
Hall space group symbol | P 2ac 2ab |
Residual factor for all reflections | 0.0353 |
Residual factor for significantly intense reflections | 0.0311 |
Weighted residual factors for significantly intense reflections | 0.0539 |
Weighted residual factors for all reflections included in the refinement | 0.0546 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.301 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4075032.html
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