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Information card for entry 4075332
Preview
| Coordinates | 4075332.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C32 H52 Cl N O Os P2 |
|---|---|
| Calculated formula | C32 H52 Cl N O Os P2 |
| SMILES | [Os]1(Cl)([P](C(C)C)(C(C)C)C(C)C)([P](C(C)C)(C(C)C)C(C)C)([NH]=C(c2c1cccc2)c1ccccc1)C#[O] |
| Title of publication | Displacement of Phenyl and Styryl Ligands by Benzophenone Imine and 2-Vinylpyridine on Ruthenium and Osmium |
| Authors of publication | Buil, María L.; Esteruelas, Miguel A.; Goni, Eva; Oliván, Montserrat; Oñate, Enrique |
| Journal of publication | Organometallics |
| Year of publication | 2006 |
| Journal volume | 25 |
| Journal issue | 12 |
| Pages of publication | 3076 |
| a | 9.9565 ± 0.0019 Å |
| b | 18.275 ± 0.003 Å |
| c | 17.73 ± 0.003 Å |
| α | 90° |
| β | 96.908 ± 0.003° |
| γ | 90° |
| Cell volume | 3202.6 ± 1 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0222 |
| Residual factor for significantly intense reflections | 0.0188 |
| Weighted residual factors for significantly intense reflections | 0.0394 |
| Weighted residual factors for all reflections included in the refinement | 0.0399 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.991 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4075332.html
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