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Information card for entry 4075560
Preview
Coordinates | 4075560.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C44 H54 O2 Si Ti |
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Calculated formula | C44 H54 O2 Si Ti |
SMILES | [Ti]12345(Oc6c(cc(cc6C(C)(C)C)C)Cc6c(O[Si]([c]71[cH]5[cH]4[cH]3[cH]27)(C)C)c(cc(c6)C)C(C)(C)C)(Cc1ccccc1)Cc1ccccc1 |
Title of publication | Monocyclopentadienyl Chloro Bisphenoxo Ti(η5-C5H4SiMe2Cl)(η2-MBMP)Cl Derivative: Ti−Cl, Ti−O, and Si−Cl Reactivity. Crystal Structure of Ti(η5-C5H4SiMe3)(η2-MBMP)Cl and Ti(η5-C5H4SiMe2-η1-MBMP)(CH2Ph)2 |
Authors of publication | González-Maupoey, Marta; Cuenca, Tomás; Herdtweck, Eberhardt |
Journal of publication | Organometallics |
Year of publication | 2006 |
Journal volume | 25 |
Journal issue | 18 |
Pages of publication | 4358 |
a | 16.2785 ± 0.0002 Å |
b | 16.9519 ± 0.0002 Å |
c | 27.6714 ± 0.0005 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 7635.96 ± 0.19 Å3 |
Cell temperature | 173 ± 1 K |
Ambient diffraction temperature | 173 ± 1 K |
Number of distinct elements | 5 |
Space group number | 61 |
Hermann-Mauguin space group symbol | P b c a |
Hall space group symbol | -P 2ac 2ab |
Residual factor for all reflections | 0.0783 |
Residual factor for significantly intense reflections | 0.061 |
Weighted residual factors for significantly intense reflections | 0.1089 |
Weighted residual factors for all reflections included in the refinement | 0.1146 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.204 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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