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Information card for entry 4075649
Preview
Coordinates | 4075649.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | Compound 1 |
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Formula | C91 H102 N2 Si8 |
Calculated formula | C91 H102 N2 Si8 |
SMILES | C(=N[Si](CC[Si](C)(c1ccccc1)c1ccccc1)(CC[Si](C)(c1ccccc1)c1ccccc1)CC[Si](C)(c1ccccc1)c1ccccc1)=N[Si](CC[Si](C)(c1ccccc1)c1ccccc1)(CC[Si](C)(c1ccccc1)c1ccccc1)CC[Si](C)(c1ccccc1)c1ccccc1 |
Title of publication | Neutral and Cationic Aluminum and Titanium Complexes Incorporating Sterically Demanding Organosilicon Ligands |
Authors of publication | Amo, Virginia; Andrés, Román; de Jesús, Ernesto; de la Mata, F. Javier; Flores, Juan C.; Gómez, Rafael; Gómez-Sal, M. Pilar; Turner, John F. C. |
Journal of publication | Organometallics |
Year of publication | 2005 |
Journal volume | 24 |
Journal issue | 10 |
Pages of publication | 2331 |
a | 13.394 ± 0.003 Å |
b | 32.088 ± 0.003 Å |
c | 10.1033 ± 0.0019 Å |
α | 90° |
β | 101.743 ± 0.01° |
γ | 90° |
Cell volume | 4251.4 ± 1.3 Å3 |
Cell temperature | 170 ± 2 K |
Ambient diffraction temperature | 170 ± 2 K |
Number of distinct elements | 4 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.1203 |
Residual factor for significantly intense reflections | 0.0664 |
Weighted residual factors for significantly intense reflections | 0.1389 |
Weighted residual factors for all reflections included in the refinement | 0.1624 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.997 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4075649.html
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Users of the data should acknowledge the original authors of the
structural data.