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Information card for entry 4075969
Preview
Coordinates | 4075969.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C19 H10 N2 O9 Os3 |
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Calculated formula | C19 H10 N2 O9 Os3 |
SMILES | C(#[O])[Os]1234(C#[O])(C#[O])C5c6ccc(c7c6[n](ccn7)[Os]1([H]3)(C#[O])(C#[O])(C#[O])[Os]25([H]4)(C#[O])(C#[O])C#[O])C |
Title of publication | Reactions of Electron-Deficient Triosmium Clusters with Diazomethane: Electrochemical Properties and Computational Studies of Charge Distribution |
Authors of publication | Mottalib, Md. Abdul; Begum, Noorjahan; Abedin, S. M. Tareque; Akter, Tahmina; Kabir, Shariff E.; Miah, Md. Arzu; Rokhsana, Dalia; Rosenberg, Edward; Hossain, G. M. Golzar; Hardcastle, Kenneth I. |
Journal of publication | Organometallics |
Year of publication | 2005 |
Journal volume | 24 |
Journal issue | 20 |
Pages of publication | 4747 |
a | 9.487 ± 0.002 Å |
b | 10.269 ± 0.003 Å |
c | 11.79 ± 0.003 Å |
α | 98.686 ± 0.007° |
β | 90.684 ± 0.009° |
γ | 99.636 ± 0.007° |
Cell volume | 1118.6 ± 0.5 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0292 |
Residual factor for significantly intense reflections | 0.0265 |
Weighted residual factors for significantly intense reflections | 0.0674 |
Weighted residual factors for all reflections included in the refinement | 0.0688 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.024 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4075969.html
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Users of the data should acknowledge the original authors of the
structural data.