Crystallography Open Database

Information card for entry 4076246

Preview

Coordinates	4076246.cif
Original paper (by DOI)	HTML

Structure parameters

Formula	C52 H62 O Si2
Calculated formula	C52 H62 O Si2
SMILES	c1(c(cccc1c1c(cc(cc1C)C)C)c1c(cc(cc1C)C)C)[Si](O[Si](c1c(cccc1c1c(cc(cc1C)C)C)c1c(cc(cc1C)C)C)(C)C)(C)C
Title of publication	Selective Formation of Functionalized Disiloxanes from Terphenylfluorosilanes
Authors of publication	Pietschnig, Rudolf; Merz, Klaus
Journal of publication	Organometallics
Year of publication	2004
Journal volume	23
Journal issue	6
Pages of publication	1373
a	26.251 ± 0.002 Å
b	13.0494 ± 0.0009 Å
c	14.919 ± 0.001 Å
α	90°
β	120.065 ± 0.002°
γ	90°
Cell volume	4423.1 ± 0.5 Å³
Cell temperature	133 ± 2 K
Ambient diffraction temperature	133 ± 2 K
Number of distinct elements	4
Space group number	15
Hermann-Mauguin space group symbol	C 1 2/c 1
Hall space group symbol	-C 2yc
Residual factor for all reflections	0.0736
Residual factor for significantly intense reflections	0.0429
Weighted residual factors for significantly intense reflections	0.1013
Weighted residual factors for all reflections included in the refinement	0.1106
Goodness-of-fit parameter for all reflections included in the refinement	0.923
Diffraction radiation wavelength	0.71073 Å
Diffraction radiation type	MoKα
Has coordinates	Yes
Has disorder	No
Has F_obs	No

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