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Information card for entry 4076706
Preview
Coordinates | 4076706.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C46 H32 Cl2 O9 Os3 P Sb |
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Calculated formula | C46 H32 Cl2 O9 Os3 P Sb |
SMILES | [Os]1([Sb](c2ccccc2)(c2ccccc2)[Os](C#[O])(C#[O])(C#[O])C#[O])([H][Os](c2c1cccc2)(C#[O])(C#[O])C#[O])([P](c1ccccc1)(c1ccccc1)c1ccccc1)(C#[O])C#[O].C(Cl)Cl |
Title of publication | Nucleophilic Addition Reactions of the Osmium−Antimony Cluster (μ-H)Os3(CO)9(μ3-C6H4)(μ-SbPh2): Orthometalation of Triphenylphosphine at Ambient Temperature |
Authors of publication | Chen, Guizhu; Deng, Mingli; Lee, Chee Keong; Leong, Weng Kee |
Journal of publication | Organometallics |
Year of publication | 2002 |
Journal volume | 21 |
Journal issue | 6 |
Pages of publication | 1227 |
a | 12.9772 ± 0.0002 Å |
b | 13.3713 ± 0.0003 Å |
c | 15.7753 ± 0.0003 Å |
α | 92.31° |
β | 109.491 ± 0.001° |
γ | 114.119 ± 0.001° |
Cell volume | 2305.04 ± 0.08 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 7 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.162 |
Residual factor for significantly intense reflections | 0.0646 |
Weighted residual factors for significantly intense reflections | 0.113 |
Weighted residual factors for all reflections included in the refinement | 0.1472 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.967 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4076706.html
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