Information card for entry 4080394

Structure parameters

• Formula: C52 H45 O P4 S4 Si
• Calculated formula: C52 H45 O P4 S4 Si
• Title of publication: A Base-Stabilized 2-Silaallene
• Authors of publication: Yang, Yi-Fan; Foo, Cechao; Xi, Hong-Wei; Li, Yongxin; Lim, Kok Hwa; So, Cheuk-Wai
• Journal of publication: Organometallics
• Year of publication: 2013
• Journal volume: 32
• Journal issue: 7
• Pages of publication: 2267
• a: 9.7149 ± 0.0006 Å
• b: 13.1293 ± 0.0008 Å
• c: 38.866 ± 0.003 Å
• α: 90.112 ± 0.004°
• β: 90.192 ± 0.004°
• γ: 105.038 ± 0.003°
• Cell volume: 4787.5 ± 0.6 ų
• Cell temperature: 103 ± 2 K
• Ambient diffraction temperature: 103 ± 2 K
• Number of distinct elements: 6
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.1598
• Residual factor for significantly intense reflections: 0.0733
• Weighted residual factors for significantly intense reflections: 0.1571
• Weighted residual factors for all reflections included in the refinement: 0.2116
• Goodness-of-fit parameter for all reflections included in the refinement: 0.969
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: Yes
• Has Fobs: No