Information card for entry 4080639
| Formula |
C48 H32 Si |
| Calculated formula |
C48 H32 Si |
| SMILES |
[Si]12(c3c(cc(cc3c3ccccc3)c3ccccc3)c3c1cccc3)c1c(cc(cc1c1ccccc1)c1ccccc1)c1c2cccc1 |
| Title of publication |
Synthesis and Photophysical Properties of Asymmetric Substituted Silafluorenes |
| Authors of publication |
Pusztai, Erika; Toulokhonova, Irina S.; Temple, Nicole; Albright, Haley; Zakai, Uzma I.; Guo, Song; Guzei, Ilia A.; Hu, Rongrong; West, Robert |
| Journal of publication |
Organometallics |
| Year of publication |
2013 |
| Journal volume |
32 |
| Journal issue |
9 |
| Pages of publication |
2529 |
| a |
9.6128 ± 0.0013 Å |
| b |
10.4695 ± 0.001 Å |
| c |
17.023 ± 0.0015 Å |
| α |
99.632 ± 0.007° |
| β |
91.463 ± 0.01° |
| γ |
93.566 ± 0.005° |
| Cell volume |
1684.7 ± 0.3 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.045 |
| Residual factor for significantly intense reflections |
0.0399 |
| Weighted residual factors for significantly intense reflections |
0.1051 |
| Weighted residual factors for all reflections included in the refinement |
0.1086 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.022 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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