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Information card for entry 4085837
Preview
Coordinates | 4085837.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C28 H51 Cl Ga N Si2 |
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Calculated formula | C28 H51 Cl Ga N Si2 |
SMILES | C1(=CCC=C([Ga]1(Cl)[n]1ccccc1)[Si](C(C)C)(C(C)C)C(C)C)[Si](C(C)C)(C(C)C)C(C)C |
Title of publication | An Isolable Anionic Gallabenzene: Synthesis and Characterization |
Authors of publication | Nakamura, Taichi; Suzuki, Katsunori; Yamashita, Makoto |
Journal of publication | Organometallics |
Year of publication | 2015 |
Journal volume | 34 |
Journal issue | 10 |
Pages of publication | 1806 |
a | 14.1431 ± 0.0016 Å |
b | 13.6702 ± 0.0014 Å |
c | 17.1961 ± 0.0019 Å |
α | 90° |
β | 112.42 ± 0.0013° |
γ | 90° |
Cell volume | 3073.4 ± 0.6 Å3 |
Cell temperature | 93 ± 2 K |
Ambient diffraction temperature | 93 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.0436 |
Residual factor for significantly intense reflections | 0.0351 |
Weighted residual factors for significantly intense reflections | 0.0794 |
Weighted residual factors for all reflections included in the refinement | 0.0838 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.082 |
Diffraction radiation wavelength | 0.71075 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4085837.html
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