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Information card for entry 4101418
Preview
Coordinates | 4101418.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C40 H60 Lu2 |
---|---|
Calculated formula | C40 H60 Lu2 |
SMILES | [Lu]123456789([c]%11([c]1([c]2([c]3([c]4%11C)C)C)C)C)([H][Lu]1234%11%12%13%14([c]%15([c]1([c]2([c]3([c]4%15C)C)C)C)C9)[c]1([c]%14([c]%13([c]%12([c]%111C)C)C)C)C)[c]1([c]8([c]7([c]6([c]51C)C)C)C)C |
Title of publication | Organolutetium vinyl and tuck-over complexes via C-H bond activation. |
Authors of publication | Evans, William J; Champagne, Timothy M; Ziller, Joseph W |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2006 |
Journal volume | 128 |
Journal issue | 44 |
Pages of publication | 14270 - 14271 |
a | 10.4914 ± 0.0014 Å |
b | 12.8272 ± 0.0017 Å |
c | 13.8975 ± 0.0018 Å |
α | 76.451 ± 0.002° |
β | 80.45 ± 0.002° |
γ | 87.137 ± 0.002° |
Cell volume | 1792.9 ± 0.4 Å3 |
Cell temperature | 163 ± 2 K |
Ambient diffraction temperature | 163 ± 2 K |
Number of distinct elements | 3 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0325 |
Residual factor for significantly intense reflections | 0.0232 |
Weighted residual factors for significantly intense reflections | 0.0587 |
Weighted residual factors for all reflections included in the refinement | 0.0637 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.049 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4101418.html
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Users of the data should acknowledge the original authors of the
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