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Information card for entry 4101802
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Coordinates | 4101802.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | 1 |
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Formula | C20 H16 S4 Si2 |
Calculated formula | C20 H16 S4 Si2 |
SMILES | c12csc3c2c2c(c4c5c6c(csc36)[Si](c5cs4)(C)C)scc2[Si]1(C)C |
Title of publication | Cyclic Tetrathiophenes Planarized by Silicon and Sulfur Bridges Bearing Antiaromatic Cyclooctatetraene Core: Syntheses, Structures, and Properties |
Authors of publication | Takeshi Ohmae; Tohru Nishinaga; Mo Wu; Masahiko Iyoda |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2010 |
Journal volume | 132 |
Pages of publication | 1066 - 1074 |
a | 9.0402 ± 0.0004 Å |
b | 9.0402 ± 0.0004 Å |
c | 25.26 ± 0.003 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 2064.4 ± 0.3 Å3 |
Cell temperature | 298 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 4 |
Space group number | 96 |
Hermann-Mauguin space group symbol | P 43 21 2 |
Hall space group symbol | P 4nw 2abw |
Residual factor for all reflections | 0.0296 |
Residual factor for significantly intense reflections | 0.028 |
Weighted residual factors for significantly intense reflections | 0.0709 |
Weighted residual factors for all reflections included in the refinement | 0.0727 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.051 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4101802.html
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