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Information card for entry 4102025
Preview
| Coordinates | 4102025.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | HLSi(NH2)-Ni(CO)3 |
|---|---|
| Formula | C32 H43 N3 Ni O3 Si |
| Calculated formula | C32 H43 N3 Ni O3 Si |
| SMILES | CC1=CC(C)=[N]([Si](N1c1c(cccc1C(C)C)C(C)C)(N)[Ni](C#[O])(C#[O])C#[O])c1c(cccc1C(C)C)C(C)C |
| Title of publication | Steering S-H and N-H Bond Activation by a Stable N-Heterocyclic Silylene: Different Addition of H2S, NH3, and Organoamines on a Silicon(II) Ligand versus Its Si(II)\ρightarrowNi(CO)3Complex |
| Authors of publication | Antje Meltzer; Shigeyoshi Inoue; Carsten Präsang; Matthias Driess |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2010 |
| Journal volume | 132 |
| Pages of publication | 3038 - 3046 |
| a | 8.822 ± 0.0003 Å |
| b | 20.0098 ± 0.0004 Å |
| c | 9.7785 ± 0.0003 Å |
| α | 90° |
| β | 111.974 ± 0.003° |
| γ | 90° |
| Cell volume | 1600.76 ± 0.09 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 11 |
| Hermann-Mauguin space group symbol | P 1 21/m 1 |
| Hall space group symbol | -P 2yb |
| Residual factor for all reflections | 0.0684 |
| Residual factor for significantly intense reflections | 0.0466 |
| Weighted residual factors for significantly intense reflections | 0.0932 |
| Weighted residual factors for all reflections included in the refinement | 0.0998 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.103 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4102025.html
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Users of the data should acknowledge the original authors of the
structural data.