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Information card for entry 4104268
Preview
Coordinates | 4104268.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C20 H26 Cl2 N3 O2 Ta |
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Calculated formula | C20 H26 Cl2 N3 O2 Ta |
SMILES | N12[Ta](N(c3c1ccc(c3)OC)C(C)C)(N(c1c2ccc(c1)OC)C(C)C)(Cl)Cl |
Title of publication | One- and Two-Electron Reactivity of a Tantalum(V) Complex with a Redox-Active Tris(amido) Ligand |
Authors of publication | Andy I. Nguyen; Karen J. Blackmore; Shawn M. Carter; Ryan A. Zarkesh; Alan F. Heyduk |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2009 |
Journal volume | 131 |
Pages of publication | 3307 - 3316 |
a | 15.8698 ± 0.0014 Å |
b | 15.8698 ± 0.0014 Å |
c | 16.868 ± 0.0014 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 4248.2 ± 0.6 Å3 |
Cell temperature | 103 ± 2 K |
Ambient diffraction temperature | 103 ± 2 K |
Number of distinct elements | 6 |
Space group number | 88 |
Hermann-Mauguin space group symbol | I 41/a :2 |
Hall space group symbol | -I 4ad |
Residual factor for all reflections | 0.0247 |
Residual factor for significantly intense reflections | 0.0187 |
Weighted residual factors for significantly intense reflections | 0.0473 |
Weighted residual factors for all reflections included in the refinement | 0.0513 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.063 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4104268.html
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