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Information card for entry 4106494
Preview
Coordinates | 4106494.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C55 H41 Cl4 Cu F6 N2 O P2 |
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Calculated formula | C55 H41 Cl4 Cu F6 N2 O P2 |
SMILES | [Cu]12([P](c3ccccc3Oc3ccccc3[P]1(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1)n1c(cc(c1c1[n]2c(ccc1)c1ccccc1)C(F)(F)F)C(F)(F)F.C(Cl)Cl.C(Cl)Cl |
Title of publication | Systematic Investigation of the Metal-Structure-Photophysics Relationship of Emissive d10-Complexes of Group 11 Elements: The Prospect of Application in Organic Light Emitting Devices |
Authors of publication | Chien-Wei Hsu; Chao-Chen Lin; Min-Wen Chung; Yun Chi; Gene-Hsiang Lee; Pi-Tai Chou; Chih-Hao Chang; Pin-Yang Chen |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2011 |
Journal volume | 133 |
Pages of publication | 12085 - 12099 |
a | 13.9226 ± 0.0009 Å |
b | 20.2681 ± 0.0012 Å |
c | 18.113 ± 0.001 Å |
α | 90° |
β | 90.146 ± 0.001° |
γ | 90° |
Cell volume | 5111.2 ± 0.5 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 8 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.0544 |
Residual factor for significantly intense reflections | 0.0443 |
Weighted residual factors for significantly intense reflections | 0.1033 |
Weighted residual factors for all reflections included in the refinement | 0.1092 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.029 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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