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Information card for entry 4109679
Preview
Coordinates | 4109679.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | Add Name |
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Formula | C54 H57 Cl8 N2 Ni O2 Sb |
Calculated formula | C54 H57 Cl8 N2 Ni O2 Sb |
SMILES | CC1=CC(=[O][Ni]2(O1)[N](=C(C(C)=[N]2c1c(cccc1c1cc(C)cc(C)c1)c1cc(C)cc(C)c1)C)c1c(cccc1c1cc(C)cc(C)c1)c1cc(C)cc(C)c1)C.C(Cl)Cl.[Cl-][Sb](Cl)(Cl)(Cl)(Cl)Cl |
Title of publication | New Nickel(II) Diimine Complexes and the Control of Polyethylene Microstructure by Catalyst Design |
Authors of publication | Dieter Meinhard; Marcus Wegner; Georgy Kipiani; Andrew Hearley; Peter Reuter; Stefan Fischer; Othmar Marti; Bernhard Rieger |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2007 |
Journal volume | 129 |
Pages of publication | 9182 - 9191 |
a | 11.8808 ± 0.0013 Å |
b | 14.4953 ± 0.0014 Å |
c | 17.514 ± 0.002 Å |
α | 88.999 ± 0.013° |
β | 80.451 ± 0.013° |
γ | 78.963 ± 0.012° |
Cell volume | 2919.1 ± 0.6 Å3 |
Cell temperature | 223 ± 2 K |
Ambient diffraction temperature | 223 ± 2 K |
Number of distinct elements | 7 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0716 |
Residual factor for significantly intense reflections | 0.0377 |
Weighted residual factors for significantly intense reflections | 0.0844 |
Weighted residual factors for all reflections included in the refinement | 0.0936 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.785 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4109679.html
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Users of the data should acknowledge the original authors of the
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