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Information card for entry 4109736
Preview
Coordinates | 4109736.cif |
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Original paper (by DOI) | HTML |
Formula | C89 H156 N12 Si2 Ta4 |
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Calculated formula | C89 H156 N12 Si2 Ta4 |
Title of publication | Dinitrogen Activation at Ambient Temperatures: New Modes of H2 and PhSiH3 Additions for an "End-On-Bridged" [Ta(IV)]2(μ-η1:η1-N2) Complex and for the Bis(μ-nitrido) [Ta(V)(μ-N)]2 Product Derived from Facile N\τbN Bond Cleavage |
Authors of publication | Masakazu Hirotsu; Philip P. Fontaine; Albert Epshteyn; Lawrence R. Sita |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2007 |
Journal volume | 129 |
Pages of publication | 9284 - 9285 |
a | 10.7416 ± 0.0005 Å |
b | 12.3472 ± 0.0006 Å |
c | 19.2441 ± 0.0009 Å |
α | 81.137 ± 0.001° |
β | 81.316 ± 0.001° |
γ | 73.391 ± 0.001° |
Cell volume | 2401.2 ± 0.2 Å3 |
Cell temperature | 220 ± 2 K |
Ambient diffraction temperature | 220 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0394 |
Residual factor for significantly intense reflections | 0.0278 |
Weighted residual factors for significantly intense reflections | 0.0577 |
Weighted residual factors for all reflections included in the refinement | 0.0623 |
Goodness-of-fit parameter for all reflections included in the refinement | 1 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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The link is: https://www.crystallography.net/4109736.html
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