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Information card for entry 4110324
Preview
Coordinates | 4110324.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C34 H49 F3 N O3 P Ru S Si |
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Calculated formula | C34 H49 F3 N O3 P Ru S Si |
SMILES | [RuH2]12345([P](C6=C([N+]([SiH]1c1ccccc1)(C)C)Cc1c6cccc1)(C(C)C)C(C)C)[c]1([c]2([c]3([c]4([c]51C)C)C)C)C.S(=O)(=O)([O-])C(F)(F)F |
Title of publication | Silylene Extrusion from Organosilanes via Double Geminal Si-H Bond Activation by a Cp*Ru(κ2-P,N)+ Complex: Observation of a Key Stoichiometric Step in the Glaser-Tilley Alkene Hydrosilylation Mechanism |
Authors of publication | Matthew A. Rankin; Darren F. MacLean; Gabriele Schatte; Robert McDonald; Mark Stradiotto |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2007 |
Journal volume | 129 |
Pages of publication | 15855 - 15864 |
a | 9.4515 ± 0.0003 Å |
b | 12.7981 ± 0.0003 Å |
c | 29.7747 ± 0.001 Å |
α | 90° |
β | 97.4604 ± 0.0014° |
γ | 90° |
Cell volume | 3571.1 ± 0.19 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 9 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.074 |
Residual factor for significantly intense reflections | 0.0444 |
Weighted residual factors for significantly intense reflections | 0.0848 |
Weighted residual factors for all reflections included in the refinement | 0.0982 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.05 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4110324.html
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Users of the data should acknowledge the original authors of the
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