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Information card for entry 4111030
Preview
| Coordinates | 4111030.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C52 H80 Cl2 Mo2 N4 Si2 |
|---|---|
| Calculated formula | C52 H80 Cl2 Mo2 N4 Si2 |
| SMILES | c1(c(C(C)C)cccc1C(C)C)N1[Mo]2(Cl)N(c3c(C(C)C)cccc3C(C)C)[Si](N(c3c(C(C)C)cccc3C(C)C)[Mo]2(N(c2c(C(C)C)cccc2C(C)C)[Si]1(C)C)Cl)(C)C |
| Title of publication | A Three-Coordinate and Quadruply Bonded Mo-Mo Complex |
| Authors of publication | Yi-Chou Tsai; Yang-Miin Lin; Jen-Shiang K. Yu; Jenn-Kang Hwang |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2006 |
| Journal volume | 128 |
| Pages of publication | 13980 - 13981 |
| a | 28.268 ± 0.0006 Å |
| b | 35.3567 ± 0.001 Å |
| c | 10.8372 ± 0.0002 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 10831.4 ± 0.4 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 43 |
| Hermann-Mauguin space group symbol | F d d 2 |
| Hall space group symbol | F 2 -2d |
| Residual factor for all reflections | 0.0511 |
| Residual factor for significantly intense reflections | 0.04 |
| Weighted residual factors for significantly intense reflections | 0.0899 |
| Weighted residual factors for all reflections included in the refinement | 0.0956 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.059 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4111030.html
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