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Information card for entry 4111467
Preview
Coordinates | 4111467.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C29 H26 Fe Ni2 Si |
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Calculated formula | C29 H26 Fe Ni2 Si |
SMILES | [Fe]123456789[c]%10([cH]2[cH]3[cH]4[cH]1%10)[Si]([c]16[cH]7[cH]8[cH]9[cH]51)(C)[C]12[Ni]34567([Ni]89%10%111([cH]1[cH]8[cH]9[cH]%10[cH]%111)[C]=27c1ccccc1)[cH]1[cH]6[cH]5[cH]4[cH]31 |
Title of publication | Highly Metallized Polymers: Synthesis, Characterization, and Lithographic Patterning of Polyferrocenylsilanes with Pendant Cobalt, Molybdenum, and Nickel Cluster Substituents |
Authors of publication | Wing Yan Chan; Scott B. Clendenning; Andrea Berenbaum; Alan J. Lough; Stephane Aouba; Harry E. Ruda; Ian Manners |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2005 |
Journal volume | 127 |
Pages of publication | 1765 - 1772 |
a | 14.277 ± 0.0002 Å |
b | 9.3405 ± 0.0004 Å |
c | 17.8241 ± 0.0005 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 2376.92 ± 0.13 Å3 |
Cell temperature | 150 ± 1 K |
Ambient diffraction temperature | 150 ± 1 K |
Number of distinct elements | 5 |
Space group number | 29 |
Hermann-Mauguin space group symbol | P c a 21 |
Hall space group symbol | P 2c -2ac |
Residual factor for all reflections | 0.048 |
Residual factor for significantly intense reflections | 0.0347 |
Weighted residual factors for significantly intense reflections | 0.0742 |
Weighted residual factors for all reflections included in the refinement | 0.0803 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.043 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4111467.html
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Users of the data should acknowledge the original authors of the
structural data.