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Information card for entry 4111736
Preview
Coordinates | 4111736.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C34 H56 Li2 N2 O2 Si2 |
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Calculated formula | C34 H56 Li2 N2 O2 Si2 |
SMILES | C[Si]1(c2ccccc2)C[N]2(CCCCC2)[Li]([Si]2(C)(c3ccccc3)[Li]1([N]1(C2)CCCCC1)[O]1CCCC1)[O]1CCCC1 |
Title of publication | Selective Si-C Bond Cleavage as Synthetic Entry to a Functionalized Lithiosilane |
Authors of publication | Carsten Strohmann; Daniel Schildbach; Dominik Auer |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2005 |
Journal volume | 127 |
Pages of publication | 7968 - 7969 |
a | 19.777 ± 0.004 Å |
b | 10.4 ± 0.002 Å |
c | 35.503 ± 0.007 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 7302 ± 2 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 6 |
Space group number | 33 |
Hermann-Mauguin space group symbol | P n a 21 |
Hall space group symbol | P 2c -2n |
Residual factor for all reflections | 0.1163 |
Residual factor for significantly intense reflections | 0.0801 |
Weighted residual factors for significantly intense reflections | 0.1663 |
Weighted residual factors for all reflections included in the refinement | 0.1829 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.02 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4111736.html
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