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Information card for entry 4112179
Preview
| Coordinates | 4112179.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C20 H20 O8 |
|---|---|
| Calculated formula | C20 H20 O8 |
| SMILES | O=C1[C@@H]2O[C@@H]2[C@@H](O)C2=C1[C@H]1[C@H](O[C@@H]2[C@H]2O[C@@H]([C@@H]1C1=C2[C@H](O)[C@H]2O[C@H]2C1=O)C)C |
| Title of publication | Synthesis of the Epoxyquinol Dimer RKB-3564 D: Utilization of an Alkoxysilanol To Promote [4 + 4] Dimerization |
| Authors of publication | Chaomin Li; John A. Porco |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2004 |
| Journal volume | 126 |
| Pages of publication | 1310 - 1311 |
| a | 8.256 ± 0.006 Å |
| b | 7.118 ± 0.005 Å |
| c | 14.087 ± 0.011 Å |
| α | 90° |
| β | 96.259 ± 0.019° |
| γ | 90° |
| Cell volume | 822.9 ± 1.1 Å3 |
| Cell temperature | 125 ± 2 K |
| Ambient diffraction temperature | 125 ± 2 K |
| Number of distinct elements | 3 |
| Space group number | 4 |
| Hermann-Mauguin space group symbol | P 1 21 1 |
| Hall space group symbol | P 2yb |
| Residual factor for all reflections | 0.0816 |
| Residual factor for significantly intense reflections | 0.0524 |
| Weighted residual factors for significantly intense reflections | 0.1051 |
| Weighted residual factors for all reflections included in the refinement | 0.1169 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.011 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4112179.html
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Users of the data should acknowledge the original authors of the
structural data.